Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge

Publisher: John Wiley & Sons Inc

E-ISSN: 1862-6270|9|4|220-224

ISSN: 1862-6254

Source: PHYSICA STATUS SOLIDI - RAPID RESEARCH LETTERS (ELECTRONIC), Vol.9, Iss.4, 2015-04, pp. : 220-224

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