Modeling the stress enhancement of plasma enhanced chemical vapor deposited silicon nitride films by UV post treatment – impact of the film density

Author： Morin P.   Benoit D.   Metz J.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|43|3|315-320

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.43, Iss.3, 2008-05, pp. : 315-320

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