Author: Vass C. Osvay K. Hopp B. Bor Z.
Publisher: Springer Publishing Company
ISSN: 0947-8396
Source: Applied Physics A, Vol.87, Iss.4, 2007-06, pp. : 611-613
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Using IR laser radiation for backside etching of fused silica
By Zimmer K. Böhme R. Rauschenbach B.
Applied Physics A, Vol. 86, Iss. 3, 2007-03 ,pp. :
Laser etching of fused silica using an adsorbed toluene layer
By Zimmer K. Böhme R. Rauschenbach B.
Applied Physics A, Vol. 79, Iss. 8, 2004-12 ,pp. :