Microstructural and Mechanical Properties of TiAlN and Ti3AlN Films Deposited by Reactive Magnetron Sputtering

Publisher： Trans Tech Publications

E-ISSN： 1662-9752|2015|816|283-288

ISSN： 0255-5476

Source： Materials Science Forum, Vol.2015, Iss.816, 2015-05, pp. : 283-288

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Effect of Nitrogen Content on Mechanical and Tribological Properties of HfCxNy Films Deposited by Reactive Magnetron Sputtering

By  

Materials Science Forum, Vol. 2015, Iss. 817, 2015-05 ,pp. : 143-149

Trans Tech Publications

Access to resources Recommend Favorite

Oxidation and Decomposition of Ti2AlN MAX Phase Coating Deposited on Nickel-Based Super Alloy IN718

By  

Materials Science Forum, Vol. 2015, Iss. 825, 2015-08 ,pp. : 628-635

Trans Tech Publications

Access to resources Recommend Favorite

Characterization of TiAlN films deposited by reactive pulsed laser ablation

By Acquaviva S.   D'Anna E.   Elia L.   Fernandez M.   Leggieri G.   Luches A.   Martino M.   Mengucci P.   Zocco A.  

Thin Solid Films, Vol. 379, Iss. 1, 2000-12 ,pp. : 45-49

Elsevier

Access to resources Recommend Favorite

Phase transition and properties of Ti-Al-N thin films prepared by r.f.-plasma assisted magnetron sputtering

By Zhou M.   Makino Y.   Nose M.   Nogi K.  

Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. : 203-208

Elsevier

Access to resources Recommend Favorite

Reactively magnetron sputtered Ti-Al-N thin films with enhanced mechanical properties

By Kourtev J.   Pascova R.  

Vacuum, Vol. 47, Iss. 10, 1996-10 ,pp. : 1197-1201

Elsevier

Access to resources Recommend Favorite