Annealing effects on microstructures of HfAlO/Si with a Ti capping layer

Author： Wan L.   Gong X.   Cheng X. H.   Luo H.   Huang Y.   Tang B.   Shangguan J.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|48|2|20302-20302

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.48, Iss.2, 2009-10, pp. : 20302-20302

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