Chloride atomic-layer chemical vapor deposition of TiO2 with a chloride pretreatment of substrates

E-ISSN： 1764-7177|11|PR11|Pr11-103-Pr11-107

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.11, Iss.PR11, 2001-12, pp. : Pr11-103-Pr11-107

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