Nanocrystalline silicon quantum dots prepared by VHF plasma enhanced chemical vapor deposition
Publisher: Edp Sciences
E-ISSN: 1764-7177|11|PR3|Pr3-1065-Pr3-1071
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.11, Iss.PR3, 2001-08, pp. : Pr3-1065-Pr3-1071
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