Comparison of dc and hf plasma treatments for hydrogenation of amorphous silicon

Publisher： Edp Sciences

E-ISSN： 0035-1687|15|2|241-244

ISSN： 0035-1687

Source： Revue de Physique Appliquée (Paris), Vol.15, Iss.2, 1980-02, pp. : 241-244

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