PROCESS CHARACTERISATION FOR LPCVD DEPOSITION OF SiO2 FILMS FROM TEOS LIQUID SOURCE

E-ISSN： 0449-1947|50|C5|C5-83-C5-90

ISSN： 0449-1947

Source： Le Journal de Physique Colloques, Vol.50, Iss.C5, 1989-05, pp. : C5-83-C5-90

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