Optimization of reactive-ion etching (RIE) parameters for fabrication of tantalum pentoxide (Ta2O5) waveguide using Taguchi method

Author： Muttalib M. Firdaus A.  

Publisher： Edp Sciences

E-ISSN： 2100-014x|162|issue|01003-01003

ISSN： 2100-014x

Source： EPJ Web of Conference, Vol.162, Iss.issue, 2017-11, pp. : 01003-01003

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