An IAEA multi‐technique X‐ray spectrometry endstation at Elettra Sincrotrone Trieste: benchmarking results and interdisciplinary applications

Publisher： John Wiley & Sons Inc

E-ISSN： 1600-5775|25|1|189-203

ISSN： 0909-0495

Source： JOURNAL OF SYNCHROTRON RADIATION (ELECTRONIC), Vol.25, Iss.1, 2018-01, pp. : 189-203

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Multipurpose end‐station for coherent diffraction imaging and scattering at FERMI@Elettra free‐electron laser facility

By  

JOURNAL OF SYNCHROTRON RADIATION (ELECTRONIC), Vol. 22, Iss. 3, 2015-05 ,pp. : 544-552

John Wiley & Sons Inc

Access to resources Recommend Favorite

The In situ growth of Nanostructures on Surfaces (INS) endstation of the ESRF BM32 beamline: a combined UHV–CVD and MBE reactor for in situ X‐ray scattering investigations of growing nanoparticles and semiconductor nanowires

By  

JOURNAL OF SYNCHROTRON RADIATION (ELECTRONIC), Vol. 22, Iss. 3, 2015-05 ,pp. : 688-700

John Wiley & Sons Inc

Access to resources Recommend Favorite

Two‐dimensional in situ metrology of X‐ray mirrors using the speckle scanning technique

By  

JOURNAL OF SYNCHROTRON RADIATION (ELECTRONIC), Vol. 22, Iss. 4, 2015-07 ,pp. : 925-929

John Wiley & Sons Inc

Access to resources Recommend Favorite

Applications of VUV extra‐focus mechanism: high‐performance dual‐mode monochromator from VUV to soft X‐ray

By  

JOURNAL OF SYNCHROTRON RADIATION (ELECTRONIC), Vol. 22, Iss. 6, 2015-11 ,pp. : 1353-1358

John Wiley & Sons Inc

Access to resources Recommend Favorite

HERMES: a soft X‐ray beamline dedicated to X‐ray microscopy

By  

JOURNAL OF SYNCHROTRON RADIATION (ELECTRONIC), Vol. 22, Iss. 4, 2015-07 ,pp. : 968-979

John Wiley & Sons Inc

Access to resources Recommend Favorite