Amorphous hydrogenated carbon films used as masks for silicon microtips fabrication in a reactive ion etching with SF 6 plasma

Author： Alves M.A.R. Porto L.F. de Faria P.H.L. Braga E.S.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.72, Iss.4, 2004-01, pp. : 485-488

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