Ultra-Shallow Chemical Characterization of Organic Thin Films Deposited by Plasma and Vacuum-Ultraviolet, Using Angle- and Excitation Energy-Resolved XPS

Author： Girard-Lauriault Pierre-Luc  

Publisher： Springer Publishing Company

ISSN： 0272-4324

Source： Plasma Chemistry and Plasma Processing, Vol.31, Iss.4, 2011-08, pp. : 535-550

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