Related content

Effect of ion-bombardment on the deposition of a-CN x :H films in CH 4 /N 2 r.f. plasma

By Mutsukura N.   Daigo Y.  

Diamond and Related Materials, Vol. 12, Iss. 10, 2003-10 ,pp. : 2057-2060

Elsevier

Access to resources Recommend Favorite

A comparative study between pure and Al-containing amorphous carbon films prepared by FCVA technique together with high substrate pulse biasing

By Sheeja D.   Tay B.K.   Sze J.Y.   Yu L.J.   Lau S.P.  

Diamond and Related Materials, Vol. 12, Iss. 10, 2003-10 ,pp. : 2032-2036

Elsevier

Access to resources Recommend Favorite

Rapid thermal annealing study on the metal containing amorphous carbon films

By Zhang P.   Tay B.K.   Lau S.P.  

Diamond and Related Materials, Vol. 12, Iss. 10, 2003-10 ,pp. : 2093-2098

Elsevier

Access to resources Recommend Favorite

Visible electroluminescence from amorphous hydrogenated silicon carbide prepared by using organic carbon source

By Huang X.   Ma T.   Xu J.   Li Z.   Mei J.   Li X.   Li W.   Huang X.   Chen K.  

Diamond and Related Materials, Vol. 12, Iss. 10, 2003-10 ,pp. : 1932-1935

Elsevier

Access to resources Recommend Favorite

Atomistic simulation of energy and temperature effects in the deposition and implantation of amorphous carbon thin films

By Marks N.A.   Bell J.M.   Pearce G.K.   McKenzie D.R.   Bilek M.M.M.  

Diamond and Related Materials, Vol. 12, Iss. 10, 2003-10 ,pp. : 2003-2010

Elsevier

Access to resources Recommend Favorite