Thin film growth of gadolinia by metal-organic chemical vapour deposition (MOCVD)

By McAleese J.   Steele B.C.H.   Plakatouras J.C.  

Thin Solid Films, Vol. 286, Iss. 1, 1996-09 ,pp. : 64-71

Elsevier

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The effect of thermal annealing on the properties of thin alumina films prepared by low pressure metal-organic chemical vapour deposition

By Haanappel V.A.C.   Van der Vendel D.   Van Corbach H.D.   Fransen T.   Gellings P.J.  

Thin Solid Films, Vol. 256, Iss. 1, 1995-02 ,pp. : 8-12

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Metal-organic chemical vapour deposition of thin films of cobalt on different substrates: study of microstructure

By Paranjape M.A.   Mane A.U.   Raychaudhuri A.K.   Shalini K.   Shivashankar S.A.   Chakravarty B.R.  

Thin Solid Films, Vol. 413, Iss. 1, 2002-06 ,pp. : 8-15

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The mechanical properties of thin alumina films deposited by metal-organic chemical vapour deposition

By Fransen T.   Haanappel V.A.C.   Van der Vendel D.   Metselaar H.S.C.   Van Corbach H.D.   Gellings P.J.  

Thin Solid Films, Vol. 254, Iss. 1, 1995-01 ,pp. : 153-163

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Low-temperature atmospheric-pressure metal-organic chemical vapor deposition of molybdenum nitride thin films

By Fix R.   Gordon R.G.   Hoffman D.M.  

Thin Solid Films, Vol. 288, Iss. 1, 1996-11 ,pp. : 116-119

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