Effects of oxygen partial pressure on the microstructure and electrical properties of indium tin oxide film prepared by d.c. magnetron sputtering

Author： Choi C.G. No K. Lee W.-J. Kim H.-G. Jung S.O. Lee W.J. Kim W.S. Yoon C. Kim S.J.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.258, Iss.1, 1995-03, pp. : 274-278

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