Aluminum nitride thin films prepared by radical-assisted pulsed laser deposition

By Ishihara M.   Yamamoto K.   Kokai F.   Koga Y.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 649-656

Elsevier

Access to resources Recommend Favorite

Nanocrystalline silicon carbonitride thin films prepared by plasma beam-assisted deposition

By Cao Z.X.  

Thin Solid Films, Vol. 401, Iss. 1, 2001-12 ,pp. : 94-101

Elsevier

Access to resources Recommend Favorite

Structures and properties of copper thin films prepared by ion beam assisted deposition

By Gotoh Y.   Yoshii H.   Amioka T.   Kameyama K.   Tsuji H.   Ishikawa J.  

Thin Solid Films, Vol. 288, Iss. 1, 1996-11 ,pp. : 300-308

Elsevier

Access to resources Recommend Favorite

Frequency dependent conductivity of aluminium nitride films prepared by ion beam-assisted deposition

By Lal K.   Meikap A.K.   Chattopadhyay S.K.   Chatterjee S.K.   Ghosh P.   Ghosh M.   Baba K.   Hatada R.  

Thin Solid Films, Vol. 434, Iss. 1, 2003-06 ,pp. : 264-270

Elsevier

Access to resources Recommend Favorite

Phase evolution in boron nitride thin films prepared by a dc-gasdischarge assisted pulsed laser deposition

By Xin H.   Shi X.   Lin C.   Xu W.-P.   Zheng L.   Zou S.  

Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. : 17-21

Elsevier

Access to resources Recommend Favorite