Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micromachining applications

Author： Kirsten M.   Wenk B.   Riethmuller W.   Lange P.   Ericson F.   Schweitz J.A.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.259, Iss.2, 1995-04, pp. : 181-187

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