Influence of sputtering pressure on the microstructure evolution of AlN thin films prepared by reactive sputtering

Author： Lee H.-C. Lee K.-Y. Yong Y.-J. Lee J.-Y. Kim G.-H. Chun C.-H. Hong S.-K.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.261, Iss.1, 1995-06, pp. : 148-153

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