Stoichiometry of tantalum oxide films prepared by KrF excimer laser-induced chemical vapor deposition

Author: Imai Y.   Watanabe A.   Mukaida M.   Osato K.   Tsunoda T.   Fukuda K.   Kameyama T.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.261, Iss.1, 1995-06, pp. : 76-82

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Abstract