Growth of Mn doped epitaxial -FeSi 2 films on Si(001) substrates by reactive deposition epitaxy

By Takakura K.   Suemasu T.   Hasegawa F.  

Thin Solid Films, Vol. 369, Iss. 1, 2000-07 ,pp. : 253-256

Elsevier

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Thermoelectric properties of -FeSi 2 single crystals and polycrystalline -FeSi 2+x thin films

By Heinrich A.   Griessmann H.   Behr G.   Ivanenko K.   Schumann J.   Vinzelberg H.  

Thin Solid Films, Vol. 381, Iss. 2, 2001-01 ,pp. : 287-295

Elsevier

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Substrate influence on the formation of FeSi and FeSi 2 films from cis-Fe(SiCl 3 ) 2 (CO) 4 by LPCVD

By Luo L.   Zybill C.E.   Ang H.G.   Lim S.F.   Chua D.H.C.   Lin J.   Wee A.T.S.   Tan K.L.  

Thin Solid Films, Vol. 325, Iss. 1, 1998-07 ,pp. : 87-91

Elsevier

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Preparation of -FeSi 2 films by chemical vapor deposition

By Mukaida M.   Hiyama I.   Tsunoda T.   Imai Y.  

Thin Solid Films, Vol. 381, Iss. 2, 2001-01 ,pp. : 214-218

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Microstructure of -FeSi 2 thin films prepared by pulsed laser deposition

By Yoshitake T.   Nagamoto T.   Nagayama K.  

Thin Solid Films, Vol. 381, Iss. 2, 2001-01 ,pp. : 236-243

Elsevier

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