Titanium nitride films for barrier applications produced by rapid thermal CVD and subsequent in-situ annealing

Author： Leutenecker R.   Froschle B.   Cao-Minh U.   Ramm P.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.270, Iss.1, 1995-12, pp. : 621-626

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

In-situ CdCl 2 treatment in CdTe films synthesized by rapid thermal annealing technique

By Chakraborty R.   Bandyopadhyaya S.   Chaudhuri S.   Pal A.K.  

Vacuum, Vol. 49, Iss. 4, 1998-04 ,pp. : 303-308

Elsevier

Access to resources Recommend Favorite

Preparation of WSI 2 by rapid thermal annealing of CVD thin films of tungsten

By Gesheva K.A.   Gogova D.S.   Beshkov G.D.   Popov V.  

Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. : 181-184

Elsevier

Access to resources Recommend Favorite

The effect of rapid thermal annealing on properties of plasma enhanced CVD silicon oxide films

By Rodriguez J.A.   Dominguez C.   Munoz F.J.   Zine N.  

Thin Solid Films, Vol. 346, Iss. 1, 1999-06 ,pp. : 202-206

Elsevier

Access to resources Recommend Favorite

Formation of MoSi 2 by rapid thermal annealing in vacuum of CVD - Mo films on silicon substrate

By Gesheva K.A.   Ivanova T.   Gogova D.   Beshkov G.  

Vacuum, Vol. 58, Iss. 2, 2000-08 ,pp. : 502-508

Elsevier

Access to resources Recommend Favorite

Formation of tantalum nitride films by rapid thermal processing

By Angelkort C.   Berendes A.   Lewalter H.   Bock W.   Kolbesen B.O.  

Thin Solid Films, Vol. 437, Iss. 1, 2003-08 ,pp. : 108-115

Elsevier

Access to resources Recommend Favorite