Atomistic aspects of diffusion and growth on the Si and Ge (111) surfaces

Author: Kaxiras E.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.272, Iss.2, 1996-01, pp. : 386-398

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract