AlN thin films prepared by ion beam induced chemical vapour deposition

By Sanchez-Lopez J.C.   Contreras L.   Fernandez A.   Gonzalez-Elipe A.R.   Martin J.M.   Vacher B.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 100-104

Elsevier

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Ar stabilisation of the cubic/tetragonal phases of ZrO 2 in thin films prepared by ion beam induced chemical vapour deposition

By Holgado J.P.   Espinos J.P.   Yubero F.   Justo A.   Ocana M.   Bentez J.   Gonzalez-Elipe A.R.  

Thin Solid Films, Vol. 389, Iss. 1, 2001-06 ,pp. : 34-42

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Formation of 'environmentally friendly' semiconductor ( -FeSi 2 ) thin films prepared by ion beam sputter deposition (IBSD) method

By Sasase M.   Nakanoya T.   Yamamoto H.   Hojou K.  

Thin Solid Films, Vol. 401, Iss. 1, 2001-12 ,pp. : 73-76

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Photocurrent performance of TiO x films prepared by Ar + ion beam-assisted reactive deposition method

By Sasase M.   Takano I.   Isobe S.   Miyake K.  

Thin Solid Films, Vol. 269, Iss. 1, 1995-11 ,pp. : 36-40

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Structures and properties of copper thin films prepared by ion beam assisted deposition

By Gotoh Y.   Yoshii H.   Amioka T.   Kameyama K.   Tsuji H.   Ishikawa J.  

Thin Solid Films, Vol. 288, Iss. 1, 1996-11 ,pp. : 300-308

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