Comparative study of properties of a-Si:H films produced by hot-filament CVD, glow discharge CVD and their hybrid version

Author： Kshirsagar S.T. Kumbhar A.A.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.283, Iss.1, 1996-09, pp. : 49-56

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Switching and filament formation in hot-wire CVD p-type a-Si:H devices

By Hu J. Branz H.M. Crandall R.S. Ward S. Wang Q.

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 249-252

Elsevier

Access to resources Recommend Favorite

Hydrogen distribution, nanostructures and optical properties of high deposition rate hot-wire CVD a-Si:H

By Baugh J. Wang K. Han D. Wu Y.

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 95-99

Elsevier

Access to resources Recommend Favorite

Combining HW-CVD and PECVD techniques to produce a-Si:H films

By Ferreira I. Fortunato E. Martins R.

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 231-235

Elsevier

Access to resources Recommend Favorite

The influence of filament temperature on crystallographic properties of poly-Si films prepared by the hot-wire CVD method

By Lee J.C. Kang K.H. Kim S.K. Yoon K.H. Song J. Park I.J.

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 188-193

Elsevier

Access to resources Recommend Favorite

Raman study of a-Si:H films deposited by PECVD at various silane temperatures before glow-discharge

By Liao N.M.

Applied Physics A, Vol. 91, Iss. 2, 2008-05 ,pp. : 349-352

Springer Publishing Company

Access to resources Recommend Favorite