The influence of the filament temperature on the structure of hot-wire deposited silicon

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Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 46-49

Elsevier

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Preparation of silicon-carbon alloy films by hot-wire CVD and their properties

By Itoh T.   Katoh Y.   Fujiwara T.   Fukunaga K.   Nonomura S.   Nitta S.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 240-243

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Switching and filament formation in hot-wire CVD p-type a-Si:H devices

By Hu J.   Branz H.M.   Crandall R.S.   Ward S.   Wang Q.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 249-252

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High-rate deposition of amorphous silicon films using hot-wire CVD with a coil-shaped filament

By Povolny H.S.   Deng X.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 125-129

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Deposition and structural characterization of poly-Si thin films on Al-coated glass substrates using hot-wire chemical vapor deposition

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Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 120-124

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