Influence of the process parameters on the properties of hydrogenated amorphous carbon thin films deposited using ECR plasma

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Elsevier

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Titanium dioxide thin film deposited by spray pyrolysis of aqueous solution

By Natarajan C.   Fukunaga N.   Nogami G.  

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Growth and characterization of AP-MOCVD iron doped titanium dioxide thin films

By Gauthier V.   Bourgeois S.   Sibillot P.   Maglione M.   Sacilotti M.  

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SEM and XPS studies of titanium dioxide thin films grown by MOCVD

By Babelon P.   Dequiedt A.S.   Mostefa-Sba H.   Bourgeois S.   Sibillot P.   Sacilotti M.  

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Selective deposition and micropatterning of titanium dioxide thin film on self-assembled monolayers

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