Structural properties of amorphous carbon nitride films prepared by remote plasma-enhanced chemical vapor deposition

Author： Baik H.K.   Kim J.H.   Kim Y.H.   Choi D.J.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.289, Iss.1, 1996-11, pp. : 79-83

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