A comparative study on the properties of TiN films prepared by chemical vapor deposition enhanced by r.f. plasma and by electron cyclotron resonance plasma

Author： Lee W.-J.   Kim J.-S.   Jun B.-H.   Lee E.-J.   Hwang C.-Y.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.292, Iss.1, 1997-01, pp. : 124-129

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