Effects of nitrogen flow rates on the growth morphology of TiAlN films prepared by an rf-reactive sputtering technique

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Thin Solid Films, Vol. 406, Iss. 1, 2002-03 ,pp. : 159-163

Elsevier

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Oxidation behavior of (Ti 1-x Al( x ))N films prepared by r.f. reactive sputtering

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Thin Solid Films, Vol. 300, Iss. 1, 1997-05 ,pp. : 171-176

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Phase transition and properties of Ti-Al-N thin films prepared by r.f.-plasma assisted magnetron sputtering

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Preparation of compositionally gradient Ti-TiN films by r.f. reactive sputtering

By Inoue S.   Ucihda H.   Takeshita K.   Koterazawa K.   Howson R.P.  

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Relationship between residual stress and structural properties of AlN films deposited by r.f. reactive sputtering

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