

Author: Neufeld E. Wang S. Apetz R. Carius R. White C.W. Thomas D.K. Buchal C.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.294, Iss.1, 1997-02, pp. : 238-241
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content










Re-Investigation of SiC/SiO2 Interface Passivation by Nitrogen Annealing
Materials Science Forum, Vol. 2017, Iss. 897, 2017-06 ,pp. :