A possible method for large area deposition of a-Si:H thin films using electron cyclotron resonance plasma-enhanced chemical vapor deposition

Author： Lee J.-H.   Park S.-K.   Shim C.-M.   Park S.   Jung D.-G.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.295, Iss.1, 1997-02, pp. : 67-72

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