Deposition of Ta 2 O 5 /SiO 2 multilayer films by a new process ''injection MOCVD''

Author： Felten F. Senateur J.P. Labeau M. Yu-Zhang K. Abrutis A.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.296, Iss.1, 1997-03, pp. : 79-81

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