The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition

Author： Kim H.-Y.   Lee K.-Y.   Lee J.-Y.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.302, Iss.1, 1997-06, pp. : 17-24

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