Room temperature wafer surface cleaning by in-situ ECR (electron cyclotron resonance) hydrogen plasma for silicon homoepitaxial growth

Author: Kim H.-w.   Zhou Z.-H.   Reif R.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.302, Iss.1, 1997-06, pp. : 169-178

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Abstract