Author: Kim H.-w. Zhou Z.-H. Reif R.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.302, Iss.1, 1997-06, pp. : 169-178
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
In-situ low temperature cleaning of silicon surfaces using hydrogen atoms
By Crossley A. Sofield C.J. Sugden S. Clampitt R. Bradley C.
Vacuum, Vol. 46, Iss. 7, 1995-07 ,pp. :
By Liu Y. C. Furukawa K. Nakashima H. Kashiwazaki Y. Gao D.W. Uchino K. Muraoka K. Suzuki H.T
Philosophical Magazine B, Vol. 79, Iss. 1, 1999-01 ,pp. :
Ex situ wafer surface cleaning by HF dipping for low temperature silicon epitaxy
Thin Solid Films, Vol. 305, Iss. 1, 1997-08 ,pp. :