Compositional and structural studies of amorphous silicon-nitrogen alloys deposited at room temperature using a sputtering-type electron cyclotron resonance microwave plasma

By Liu Y. C.   Furukawa K.   Nakashima H.   Kashiwazaki Y.   Gao D.W.   Uchino K.   Muraoka K.   Suzuki H.T  

Philosophical Magazine B, Vol. 79, Iss. 1, 1999-01 ,pp. : 137-148

Taylor & Francis Ltd

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Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition

By Giorgis F.   Giuliani F.   Pirri C. F.   Tresso E.   Summonte C.   Rizzoli R.   Galloni R.   Desalvo A.   Rava P.  

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Effect of hydrogen dilution on the optical properties of hydrogenated amorphous silicon-nitrogen films prepared by plasma deposition

By Yamaguchi Masaaki  

Philosophical Magazine, Vol. 83, Iss. 25, 2003-09 ,pp. : 2955-2972

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Properties of high growth rate amorphous silicon deposited by MC-RF-PECVD

By Lavareda G.   Nunes de Carvalho C.   Amaral A.   Conde J.P.   Vieira M.   Chu V.  

Vacuum, Vol. 64, Iss. 3, 2002-01 ,pp. : 245-248

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Characterization of silicon films deposited in presence of nitrogen plasma

By Patil S.J.   Bodas D.S.   Ethiraj A.S.   Purandare R.C.   Phatak G.J.   Kulkarni S.K.   Gangal S.A.  

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