Copper nitride thin films prepared by reactive radio-frequency magnetron sputtering

By Nosaka T.   Yoshitake M.   Okamoto A.   Ogawa S.   Nakayama Y.  

Thin Solid Films, Vol. 348, Iss. 1, 1999-07 ,pp. : 8-13

Elsevier

Access to resources Recommend Favorite

Structure and properties of copper nitride films formed by reactive magnetron sputtering

By Pierson J.F.  

Vacuum, Vol. 66, Iss. 1, 2002-06 ,pp. : 59-64

Elsevier

Access to resources Recommend Favorite

Growth of nitrogen stabilised cubic ZrO 2 phase by reactive magnetron sputtering using two reactive gases

By Collard S.   Kupfer H.   Hoyer W.   Hecht G.  

Vacuum, Vol. 55, Iss. 2, 1999-11 ,pp. : 153-157

Elsevier

Access to resources Recommend Favorite

Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering

By Chappe J.-M.   Martin N.   Terwagne G.   Lintymer J.   Gavoille J.   Takadoum J.  

Thin Solid Films, Vol. 440, Iss. 1, 2003-09 ,pp. : 66-73

Elsevier

Access to resources Recommend Favorite

Preparation of SiO 2 films with embedded Si nanocrystals by reactive r.f. magnetron sputtering

By Seifarth H.   Grotzschel R.   Markwitz A.   Matz W.   Nitzsche P.   Rebohle L.  

Thin Solid Films, Vol. 330, Iss. 2, 1998-09 ,pp. : 202-205

Elsevier

Access to resources Recommend Favorite