Deposition of silicon oxinitride films from hexamethyldisilizane (HMDS) by PECVD

Author: Gonzalez-Luna R.   Rodrigo M.T.   Jimenez C.   Martnez-Duart J.M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.317, Iss.1, 1998-04, pp. : 347-350

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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Abstract