Electron beam stabilization and dissolution behaviors of advanced deep UV photoresist for sub 0.3 m microelectronics fabrication

Author： Shi F.F.   Yu S.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.322, Iss.1, 1998-06, pp. : 254-258

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Advanced plasma technology in microelectronics

By Jung C.O.   Chi K.K.   Hwang B.G.   Moon J.T.   Lee M.Y.   Lee J.G.  

Thin Solid Films, Vol. 341, Iss. 1, 1999-03 ,pp. : 112-119

Elsevier

Access to resources Recommend Favorite

In situ electron-beam processing for III-V semiconductor nanostructure fabrication

By Ishikawa T.   Kohmoto S.   Nishimura T.   Asakawa K.  

Thin Solid Films, Vol. 373, Iss. 1, 2000-09 ,pp. : 170-175

Elsevier

Access to resources Recommend Favorite

The Effects of Electron Beam Irradiation on Structural and Optical Properties of TiO2 Particles

By  

Materials Science Forum, Vol. 2017, Iss. 888, 2017-04 ,pp. : 297-303

Trans Tech Publications

Access to resources Recommend Favorite

Optical and Electron-Beam Recording of Surface Relief’s Using Ge5As37S58–Se Nanomultilayers as Registering Media

By  

Journal of Nano Research, Vol. 2016, Iss. 39, 2016-03 ,pp. : 96-104

Trans Tech Publications

Access to resources Recommend Favorite

Submicron Channel Fabrication in Photoresist Film Using Continuous Wave Laser

By Tomiyasu Masateru   Egami Chikara  

Molecular Crystals and Liquid Crystals, Vol. 568, Iss. 1, 2012-12 ,pp. : 66-69

Taylor & Francis Ltd

Access to resources Recommend Favorite