Preparation of YBa 2 Cu 3 O x superconducting thin films via combustion chemical vapor deposition

By Book G.W.   Carter W.B.   Polley T.A.   Kozaczek K.J.  

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 32-35

Elsevier

Access to resources Recommend Favorite

Growth of Fe 3 N films via chemical vapor deposition of iron acetylacetonate and anhydrous ammonia

By Roberson S.L.   Finello D.   Banks A.D.   Davis R.F.  

Thin Solid Films, Vol. 326, Iss. 1, 1998-08 ,pp. : 47-50

Elsevier

Access to resources Recommend Favorite

On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiO x N y films

By Alayo M.I.   Pereyra I.   Scopel W.L.   Fantini M.C.A.  

Thin Solid Films, Vol. 402, Iss. 1, 2002-01 ,pp. : 154-161

Elsevier

Access to resources Recommend Favorite

Growth of In x Ga 1-x N thin films on indium tin oxide/glass substrates by RF plasma enhanced chemical vapor deposition

By Park D.-C.   Ko H.-C.   Fujita S.   Fujita S.  

Thin Solid Films, Vol. 338, Iss. 1, 1999-01 ,pp. : 9-12

Elsevier

Access to resources Recommend Favorite

Characterization of multilayered Ti/TiN films grown by chemical vapor deposition

By Hu J.C.   Chang T.C.   Chen L.J.   Yang Y.L.   Chang C.Y.  

Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. : 423-427

Elsevier

Access to resources Recommend Favorite