On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiO x N y films

Author： Alayo M.I.   Pereyra I.   Scopel W.L.   Fantini M.C.A.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.402, Iss.1, 2002-01, pp. : 154-161

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Characterization of SiO x N y films deposited from SiCI 4 by remote plasma-enhanced chemical vapor deposition

By Sanchez O.   Aguilar M.A.   Falcony C.   Martnez-Duart J.M.   Hernandez Velez M.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 149-152

Elsevier

Access to resources Recommend Favorite

Plasma-enhanced chemical vapor deposition of SiO x /SiN x Bragg reflectors

By Gottschalch V.   Schmidt R.   Rheinlander B.   Pudis D.   Hardt S.   Kvietkova J.   Wagner G.   Franzheld R.  

Thin Solid Films, Vol. 416, Iss. 1, 2002-09 ,pp. : 224-232

Elsevier

Access to resources Recommend Favorite

Growth and microhardness of SiC films by plasma-enhanced chemical vapor deposition

By Seo J.-Y.   Yoon S.-Y.   Niihara K.   Kim K.H.  

Thin Solid Films, Vol. 406, Iss. 1, 2002-03 ,pp. : 138-144

Elsevier

Access to resources Recommend Favorite

Characterization of trimethylaluminum-N 2 O-He glow discharge in plasma-enhanced chemical vapor deposition of aluminum oxide films

By Kim Y.-C.   Chun J.S.   Lee W.-J.  

Thin Solid Films, Vol. 258, Iss. 1, 1995-03 ,pp. : 67-74

Elsevier

Access to resources Recommend Favorite

Studies of the earliest stages of plasma-enhanced chemical vapor deposition of SiO 2 on polymeric substrates

By Dennler G.   Houdayer A.   Latreche M.   Segui Y.   Wertheimer M.R.  

Thin Solid Films, Vol. 382, Iss. 1, 2001-02 ,pp. : 1-3

Elsevier

Access to resources Recommend Favorite