Effect of substrate temperature on the bonded states of indium tin oxide thin films deposited by plasma enhanced chemical vapor deposition

By Kim Y.-S.   Park Y.-C.   Ansari S.G.   Lee B.-S.   Shin H.-S.  

Thin Solid Films, Vol. 426, Iss. 1, 2003-02 ,pp. : 124-131

Elsevier

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A comparative study on the properties of TiN films prepared by chemical vapor deposition enhanced by r.f. plasma and by electron cyclotron resonance plasma

By Lee W.-J.   Kim J.-S.   Jun B.-H.   Lee E.-J.   Hwang C.-Y.  

Thin Solid Films, Vol. 292, Iss. 1, 1997-01 ,pp. : 124-129

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Dependence of the properties of (Sr x Ti 1-x )O 3 thin films deposited by plasma-enhanced metal-organic chemical vapor deposition on electron cyclotron resonance plasma

By Lee J.S.   Song H.W.   Jun B.-H.   Kwack D.H.   Yu B.G.   Jiang Z.-T.   No K.  

Thin Solid Films, Vol. 301, Iss. 1, 1997-06 ,pp. : 154-161

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On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiO x N y films

By Alayo M.I.   Pereyra I.   Scopel W.L.   Fantini M.C.A.  

Thin Solid Films, Vol. 402, Iss. 1, 2002-01 ,pp. : 154-161

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Reactive thermal deposition of indium oxide and tin-doped indium oxide thin films on InP substrates

By Thilakan P.   Kumar J.  

Thin Solid Films, Vol. 292, Iss. 1, 1997-01 ,pp. : 50-54

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