Author: Komatsu Y. Sato T. Ito S. Akashi K.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.341, Iss.1, 1999-03, pp. : 132-135
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Preparation of SiO 2 thin films using the Cat-CVD method
By Saito K. Uchiyama Y. Abe K.
Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. :
Deposition of BaTiO 3 thin films by plasma MOCVD
By Chiba T. Itoh K.-I. Matsumoto O.
Thin Solid Films, Vol. 300, Iss. 1, 1997-05 ,pp. :
Pure and doped CeO 2 thin films prepared by MOCVD process
By Pan M. Meng G.Y. Xin H.W. Chen C.S. Peng D.K. Lin Y.S.
Thin Solid Films, Vol. 324, Iss. 1, 1998-07 ,pp. :