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Electrophysical properties of thin germanium/carbon layers produced on silicon using organometallic radio frequency plasma enhanced chemical vapor deposition process

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Optical properties of silicon nanocrystallites in polycrystalline silicon films prepared at low temperature by plasma-enhanced chemical vapor deposition

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Properties of low dielectric constant fluorinated silicon oxide films prepared by plasma enhanced chemical vapor deposition

By Kim K.   Kwon D.   Lee G.S.  

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Microwave plasma chemical vapor deposition of diamond films with low residual stress on large area porous silicon substrates

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