SiO 2 Etching using high density plasma sources

Author: Tsukada T.   Nogami H.   Nakagawa Y.   Wani E.   Mashimo K.   Sato H.   Samukawa S.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.341, Iss.1, 1999-03, pp. : 84-90

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Abstract