Particle formation and a-Si:H film deposition in narrow-gap RF plasma CVD

Author: Maemura Y.   Fujiyama H.   Takagi T.   Hayashi R.   Futako W.   Kondo M.   Matsuda A.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.345, Iss.1, 1999-05, pp. : 80-84

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Abstract