The effect of rapid thermal annealing on properties of plasma enhanced CVD silicon oxide films

Author： Rodriguez J.A.   Dominguez C.   Munoz F.J.   Zine N.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.346, Iss.1, 1999-06, pp. : 202-206

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