Silicidation reactions with Co-Ni bilayers for low thermal budget microelectronic applications

Author: Saha S.K.   Howell R.S.   Hatalis M.K.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.347, Iss.1, 1999-06, pp. : 278-283

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Abstract