Effects of N 2 plasma treatment of titanium nitride/borophosphosilicate glass patterned substrates on metal organic chemical vapor deposition of copper

Author: Suk Kim Y.   Jung D.   Min S.-K.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.349, Iss.1, 1999-07, pp. : 36-42

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Abstract