Effect of H 2 and N 2 in the remote plasma enhanced metal organic chemical vapor deposition of TiN from tetrakis-diethyl-amido-titanium

Author： Yun J.-Y. Rhee S.-W.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.312, Iss.1, 1998-01, pp. : 24-26

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